High purity alumina
5N/4N5/6N/Purity, 99.999% high purity alumina (aluminum oxide)
To meet the extremely high purity, thermal, and optical performance requirements of high-end fields such as semiconductors, electronics, optics, and new energy, KOSNANO produces 5N high-purity aluminum oxide (Al₂O₃, purity ≥99.999%) with a total impurity content of ≤10 ppm, or just 10 parts per million. The primary impurities are controlled to elements such as Na, Fe, Si, Mg, Ca, Ti, and Cr, which can severely impact electronic, optical, and electrochemical performance. High-purity aluminum oxide typically has a crystal form of α-Al₂O₃ (corundum), which offers a dense structure and high thermal stability.
High purity alumina manufacturer in China
KOSNANO uses high-purity raw materials, undergoes multi-stage purification, and is produced in an ultra-clean environment to avoid secondary contamination. Ultra-trace detection equipment such as ICP-MS is used to control each impurity to ensure purity. The product is widely used in LED sapphire crystal growth, laser crystals, transparent ceramics, and phosphor applications. High-purity alumina is the core foundation for achieving higher chip performance, safer batteries, and purer optical materials.
Whether you are using it in the formulation of diaphragm ceramic coating, electrode surface protection coating, LED sapphire crystal growth, or laser crystal formulation, as long as you need formulation guidelines, our technology will always support you !
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